Sputtering Targets for Functional Thin Films
Summary
We have a wide range of sputtering targets for various light-related functional thin films. These are expected to be used not only for FPD pixel electrodes but also for a range of light receiving/emitting devices, optical adjustment films, and various other applications.
This special stacked film has lower resistance and higher transmittance than ITO film conventionally used for FPD pixel electrodes.
IZO is a transparent conductive film with higher transmittance in the near-infrared region than ITO. No heat treatment is required, allowing deposition on heat-sensitive materials such as plastics.
The BM target series can produce semi-transparent to fully light-shielding films by adjusting the sputtering conditions. For example, BM film can be used to prevent reflection from metal under-layers, or for dark metallic decorative films.
The NS target series can produce films with a wide range of refractive indices required for optical adjustment, together with other features such as high barrier properties and excellent weatherability.
Application Examples
We have a wide range of sputtering targets for various functional thin films related to "light", which are expected to be used not only for FPD pixel electrodes but also for various light receiving/emitting devices, optical adjustment films, and various other applications. We can also design materials to meet your needs.
Transparent conductive thin film for pixel electrode
Features
In addition to ITO targets, which are standard material for FPD pixel electrodes, we also offer IZO targets for OLED, which can be processed at low temperatures, and IGZO targets for oxide semiconductors, which feature large-area deposition and enable low power consumption devices. All of these targets are designed to minimize particle generation during deposition.
IZO film with conductivity and visible to NIR region transparency
Features
IZO is a transparent conductive film with higher transmittance in the near-infrared region than ITO. No heat treatment is required, allowing deposition on heat-sensitive materials such as plastics. The amorphous film structure provides high surface smoothness.
Special stacked film with low resistance and high transmittance
Features
This is a special stacked film with lower resistance and higher transmittance than ITO film conventionally used as a pixel electrode of FPDs.
Black films by BM target series
Features
The BM target series can produce semi-transparent to fully light-shielding films by adjusting sputtering conditions. BM film reduces metallic reflection from under layer by optical interference, which prevents glare of metal interconnections for example. The multi-layer film with metal film can be etched simultaneously.
Optical and barrier films by NS target series
Features
The NS target series can produce films with a wide range of refractive indices required for optical adjustment with other features such as high barrier and excellent weatherability.
Sputtering Targets
FAQ
What is the film deposition method?
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All our materials can be deposited by DC sputtering. The film properties of some materials can be optimized or improved by addition of a small amount of oxygen in sputtering gas.
Special stacked film has lower resistance and higher transmittance than ITO film. Are these features for mono-layer?
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The special stacked film is bi-layered. Superior properties exceeding those of ITO films can be obtained after annealing.
What are the advantages of IZO film?
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The stable structure of IZO film is amorphous, and low resistivity and high transmittance can be obtained without heat treatment, which is indispensable for ITO film. IZO is, therefore, suitable to form a film on materials with poor heat resistance like organics. IZO film also has mechanical flexibility and shows little increase in film resistance after cyclic bending tests.
What is the difference between BM target and black resist?
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BM film itself is black but the light shielding effect is not as high as a black resist, because the optical absorption of BM film is not high. BM film blocks reflection from the underlying metal surface by the interference effect, which is the same principle as anti-reflection coating of an optical lens. BM film layered with metal film can be etched simultaneously in photolithography processes.
What is the purpose of NS films?
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Light is reflected at the interface between films with different refractive indices, resulting in a decrease in light transmittance. Inserting a film with an intermediate refractive index into the interface reduces reflection and consequently improves transmittance. In addition, the stable amorphous structure of the film means that little film stress is generated, making it easy to manufacture multilayer films. Furthermore, the film itself has barrier properties, so can be used as an encapsulation film.
Are test samples available for evaluation?
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We can provide evaluation samples, although the substrate size is limited. We can also suggest the optimal material for your usage situation. Please consult us to discuss.